大同大學 教職員資料 (Information of TTU Faculty & Staff)
 
基本資料 (Basic Info)
姓名:林炯暐 (Lin, Chiung-Wei) 教授
單位:電機工程學系  
電話:  
手機:  
email:lincw@ttu.edu.tw  
網址:  
 
學歷 (Education)
國立交通大學 電子工程研究所 博士 (1993/9 ~ 1997/6)
國立交通大學 電子工程研究所 碩士 (1991/9 ~ 1993/6)
私立大同工學院 電機工程學系 學士 (1986/9 ~ 1991/6)
 
經歷 (Experience)
大同大學 電機系與材料學系合聘 教授 (2017/8 ~ 今)
大同大學 電機工程學系 教授 (2014/08 ~ 今)
大同大學 光電工程研究所 教授 (2011/2 ~ 2014/7)
大同大學 光電工程研究所 副教授 (2007/2 ~ 2011/2)
大同大學 光電工程研究所 助理教授 (2002/7 ~ 2007/2)
財團法人工業技術研究院 電子工業研究所 工程師 (1997/10 ~ 2002/7)
 
專長 (Specialty)
軟性電子技術 flexible electronics technology
積體電路技術、半導體元件物理、平面顯示器、太陽能電池 IC technology, flat panel display, solar cell
透明電子技術 transparent electronics technology
 
開授課程 (Course)
電路學 electric circuits
平面顯示器技術 Flat Panel Display Technology
軟性電子技術 Flexible Electronics
液晶元件實驗 Liquid Crystal Display Cell Experiment
液晶顯示器原理 Principle of Liquid Crystal Display
半導體實驗 Semiconductor Experiment
太陽能電池技術 Solar cell technology
光電半導體原理與製程技術 Technology of Optoelectronic Semiconductor Devices
薄膜電晶體技術 Thin Film Transistor Technology
單元操作 Unit Process
 
獎勵 (Award)
105年度大同大學研究成果績優獎 (大同大學 2016-10-29)
104學年度大同大學教師產學合作貢獻獎 (大同大學 2016-07-19)
TACT 2015 International Thin Films Conference 論文優等獎 (台灣鍍膜科技協會 2015-12-31)
103學年度大同大學產學合作成果發表會—基礎研究案成果海報發表優勝獎 (大同大學 2015-12-08)
103學年度大同大學教師產學建教特優獎 (大同大學 2015-08-19)
大同大學103學年產學建教優等獎 (大同大學 2014-11-01)
TACT 2013 International Thin Films Conference 論文優等獎 (台灣鍍膜科技協會 2013-10-26)
102學年度國家科學委員會特殊優秀人才獎勵 (國科會 2013-08-14)
101學年度國家科學委員會特殊優秀人才獎勵 (國科會 2012-08-09)
TACT 2011 International Thin Films Conference 論文優等獎 (台灣鍍膜科技協會 2011-11-22)
100學年度國家科學委員會特殊優秀人才獎勵 (國家科學委員會 2011-08-01)
2011 AVS International Plasma Workshop—on Processing and Characterization of Advance Materials最佳論文獎 (American Vacuum Society 2011-03-24)
大同大學96學年建教合作佳作獎 (大同大學 2007-11-22)
大同大學96學年論文佳作獎 (大同大學 2007-11-22)
大同大學95學年度論文獎佳作獎 (大同大學 2006-11-30)
 
服務 (Service)
大同大學環安委員會委員 (2016-07-01 ~ 今)
大同大學電機工程學系招生委員 (2015-08-01 ~ 今)
大同大學教學精進推動委員會教師代表 (2013-08-01 ~ 今)
VLSI design reviewer (2012-09-01 ~ 今)
AISS reviewer (2012-07-01 ~ 今)
Int'l Journal of Molecular Science reviewer (2011-02-01 ~ 今)
教育部K-12 能源科技教育種子教師培訓教授 (2010-11-01 ~ 今)
物理組教師評議委員 (2009-08-01 ~ 今)
中國工程期刊審稿 (2009-06-01 ~ 今)
IEEE Electron Device Letter reviewer (2007-10-01 ~ 今)
J. Non-crystalline solids reviewer (2006-10-01 ~ 今)
光電顯示學程主持人 (2003-10-01 ~ 今)
液晶元件實驗室 (2002-09-01 ~ 今)
快速元件實驗室 (2002-07-01 ~ 今)
東南科技大學教師升等審查委員 (2013-09-01 ~ 2013-10-31)
光電所行政助理 (2013-08-01 ~ 2014-09-30)
大同大學圖書館委員會委員 (2013-08-01 ~ 2014-08-31)
光電所碩士班導師 (2012-08-01 ~ 2013-07-31)
光電所校務會議代表 (2011-08-01 ~ 2013-07-31)
大同大學採購審查會委員 (2011-08-01 ~ 2013-07-31)
大同大學採購審議委員 (2011-08-01 ~ 2013-06-30)
大同大學環安衛委員會委員 (2011-08-01 ~ 2013-05-31)
光電所碩博士班招生委員會主委 (2011-08-01 ~ 2012-07-31)
大同大學創新育成中心進駐審查會委員 (2010-05-01 ~ 2011-07-31)
台北海洋技術學院教師升等審查委員。 (2009-12-01 ~ 2009-12-31)
萬能科技大學第四屆電資科技應用論文發表研討會議程委員 (2009-12-01 ~ 2009-12-31)
2009年台灣光電研討會 (OPT 2009) 擔任影像顯示科技及技術領域議程委員 (2009-11-01 ~ 2009-12-31)
研究發展處尖端技術中心主任 (2009-08-01 ~ 2011-07-31)
研究發展處綜合企劃組主任 (2009-08-01 ~ 2011-07-31)
智慧財產權審議委員 (2009-08-01 ~ 2011-07-31)
光電所IEET認證委員會委員 (2009-08-01 ~ 2014-08-31)
2008 IEDMS reviewer (2008-09-01 ~ 2008-10-31)
光電所碩士班導師 (2008-08-01 ~ 2009-07-31)
2007光電系統與顯示研討會 (2007-12-01 ~ 2007-12-31)
光電所碩博士班招生委員會主委 (2007-08-01 ~ 2008-07-31)
光電所碩博士班招生委員會主委 (2003-08-01 ~ 2004-07-31)
 
研究計畫 (Project)
低溫複晶鍺製備與其薄膜元件技術應用
科技部 MOST 108-2221-E-036-004 執行期間:2019-08-01 ~ 2021-07-31
微氧化製程對於P型氧化鋅半導體技術之研究
大同大學 B108-T05-029 執行期間:2019-01-01 ~ 2019-11-30
氧化鎳半導體材料之電漿氧化研究
大同大學 B107-T04-028 執行期間:2018-01-01 ~ 2018-11-30
透明氧化鎳半導體材料技術開發
大同大學 B106-E03-015 執行期間:2017-01-01 ~ 2017-11-30
穩定p型氧化鋅薄膜之研究與薄膜電晶體應用
科技部 MOST 105-2221-E-036-018 執行期間:2016-08-01 ~ 2017-08-31
矽含量對於氧化鉿之影響
大同大學 B105-E02-032 執行期間:2016-01-01 ~ 2016-11-30
氮鈍化對於氧化鋅電晶體的影響
大同大學 B104-E02-038 執行期間:2015-01-01 ~ 2015-11-30
以氮化鋅前驅物製備低溫P型氧化物半導體及其薄膜元件之應用(III)
國科會 MOST 103-2221-E-036-031 執行期間:2014-08-01 ~ 2015-07-31
低反射次波長結構之研究
大同大學 B103-O01-014 執行期間:2014-01-01 ~ 2014-12-31
以氮化鋅前驅物製備低溫P型氧化物半導體及其薄膜元件之應用(II)
國科會 NSC 102-2221-E-036-035 執行期間:2013-08-01 ~ 2014-07-31
以微氫化製程改善非/單晶矽異質接面
大同大學 B101-O05-041 執行期間:2012-10-01 ~ 2013-12-31
以氮化鋅前驅物製備低溫P型氧化物半導體及其薄膜元件之應用(I)
國科會 NSC 101-2221-E-036-037 執行期間:2012-08-01 ~ 2013-07-31
寬能隙半導體/矽異質接面之改善
大同大學 B100-O01-041 執行期間:2011-09-01 ~ 2012-07-15
P型氧化鋅薄膜技術開發與其在透明互補式反相器之應用(II)
國科會 NSC 100-2221-E-036 -004 - 執行期間:2011-08-01 ~ 2012-07-31
透明金屬氧化異質接面太陽電池技術開發
大同大學 B99-O04-053 執行期間:2010-09-01 ~ 2011-07-15
P型氧化鋅薄膜技術開發與其在透明互補式反相器之應用(I)
國科會 NSC 99-2221-E-036 -040 執行期間:2010-08-01 ~ 2011-07-31
軟性電子關鍵技術之低溫 (200 oC) 結晶矽膜技術開發與應用
國科會 NSC-97-2221-E-036-041 執行期間:2008-08-01 ~ 2009-07-31
200˚C微晶矽薄膜技術開發及其在薄膜電晶體之應用
中華映管公司 E9712-O02-023 執行期間:2008-08-01 ~ 2009-07-31
先進光電顯示學程
教育部 執行期間:2008-02-01 ~ 2009-01-31
低溫離子核化之矽半導體結晶技術開發與應用(I)
國科會 NSC96-2221-E036-038 執行期間:2007-08-01 ~ 2008-07-31
軟性結晶Si TFT陣列整合技術
工業技術研究院 E9606-O04-056 執行期間:2007-01-01 ~ 2008-12-31
新穎非晶半導體結晶技術開發以及其在光電元件之應用(I)
國科會 NSC95-2221-E-036-046 執行期間:2006-08-01 ~ 2007-07-31
低溫微晶矽薄膜電晶體之開發
中華映管 E9507-O01-001 執行期間:2006-08-01 ~ 2007-07-31
新型低溫快速半導體結晶技術開發(II)
國科會 執行期間:2005-08-01 ~ 2006-08-31
次世代薄膜電晶體技術開發
中華映管 執行期間:2005-08-01 ~ 2006-07-31
微晶矽薄膜電晶體可靠度研究
工研院電子所 執行期間:2005-01-01 ~ 2005-12-31
系統面板關鍵技術之開發─子計畫一:新型低溫快速半導體結晶技術開發(I)
國科會 執行期間:2004-08-01 ~ 2005-07-31
用於系統面板之新型低溫多晶矽薄膜電晶體開發
中華映管 執行期間:2004-08-01 ~ 2005-07-31
用於有機發光二極體面板之微晶矽薄膜電晶體
工研院電子所 執行期間:2004-01-01 ~ 2004-12-31
快速升溫結晶技術在塑膠基板顯示器之研究
國科會 執行期間:2003-08-01 ~ 2004-07-31
快速升溫退火處理對於半導體薄膜結晶之特性研究
國科會 執行期間:2002-12-01 ~ 2003-07-31
 
專 利 (Patent)
張志祥、王文通、戴遠東、林烱暐、陳麒麟、廖宗能、李啟聖, "可撓式薄膜電晶體顯示器的製造方法," 中華民國發明專利第184717號, Oct 2003
林烱暐、葉永輝, "薄膜電晶體的結構、其製造方法," 中華民國發明專利第198288號, Feb 2004
林烱暐、鄧建甫、陳易良, "抗反射層基板及其製作方法," 中華民國發明專利第 I 267897號, Dec 2006
黃順發、陳麒麟、林烱暐, "Heating plate crystallization method," US patent 6,977,206, 2005
Lin, Chiung-Wei(本校職員); Teng, Chien-Fu(學生) and Chen, Yi-Liang(學生), "ANTI-REFLECTIVE SUBSTRATE AND THE MANUFACTURING METHOD THERE OF," Australian patent 2006201341
陳麒麟(校外人士)、黃順發(校外人士)、林烱暐(本校職員), "熱板結晶製造方法," 中華民國專利權號數:發明第二五四四五六號
Chiung-Wei Lin (本校職員)、Sheng-Chi Lee (學生)、Yi-Liang Chen (學生)、Rui-Cheng Huang (學生) Te-Hua, "Method of Fabricating Poly Silicon Layer," US patent 7,449,377, 2008
Chiung-Wei Lin(本校職員)、Chein-Fu Teng(學生)、Yi-Liang Chen(學生), "ANTI-REFLECTIVE SUBSTRATE AND THE MANUFACTURING METHOD THEREOF," US patent 7,524,773 B2
Chiung-Wei Lin(本校職員)、Chein-Fu Teng(學生)、Yi-Liang Chen(學生), "ANTI-REFLECTIVE SUBSTRATE AND THE MANUFACTURING METHOD THEREOF," CA patent 2,541,879
林烱暐(本校職員)、李建鋒(學生)、陳易良(學生), "一種具低熱載子效應之半導體結構," 中華民國發明專利第315101號
林烱暐(本校老師)、張俊彥(外校人士)、李聖琦(本校學生)、李永祥(外校人士), "低溫多晶體材料及其製造方法," 中華民國發明專利第324398號
林烱暐(本校教師)、鄧建甫(學生)、陳易良(學生), "抗反射層基板及其製作方法," 日本, 特許第4560652號
林烱暐(本校教師)、鄧建甫(本校學生)、陳易良(本校學生), "抗反射層基板及其製作方法," CN677260
林烱暐(本校老師)、陳易良(本校學生), "一種製造多晶半導體的方法," KR 10-1020360
林烱暐(本校老師)、鄧建甫(本校學生)、陳易良(本校學生), "抗反射層基板及其製作方法," EP 1845562
Chiung-Wei Lin(本校教師)、Yi-Liang Chen(本校學生), "Method of Fabricating Polycrystalline Semiconductor," US 8,008,171 B2
張志祥(外校人士)、王文通(外校人士)、林炯暐(本校老師)、陳麒麟(外校人士), "製造主動式塑膠平面顯示器的方法," 中華民國發明專利第313062號
林烱暐(本校教師)、陳易良(本校學生), "高性能光電元件," 日本專利權號數:特許第4901834號
林烱暐(本校教師)、陳易良(學生), "一種多晶半導體之製備方法," 中華民國發明專利第359460號
林烱暐(本校老師)、陳易良(本校學生), "太陽能電池及其製造方法," US 8,299,353 B2
林烱暐(本校老師)、陳易良(本校學生), "光電轉換裝置及其製法," 特許第5248471號
林烱暐(本校教師)、陳易良(本校學生), "太陽能電池及其製造方法," 中華民國發明專利第396292號
林烱暐(本校老師)、陳易良(學生), "光伏電池結構," 中華民國發明專利第436490號
林烱暐(本校教師),阮政傑(學生),陳易良(學生),林顯杰(學生), "ANTIREFLECTION SUBSTRATE STRUCTURE AND MANUFACTURING METHOD THEREOF," US patent 9,224,893 B2, 2015
林炯暐(本校教師)、陳易良, "高性能光電元件," 中華民國發明專利第513014號
林烱暐(本校老師)、阮政傑(本校學生)、陳易良(本校學生)、林顯杰(本校學生), "抗反射基板結構及其製作方法," 中華民國發明專利第564585號
林烱暐(本校老師)、阮政傑(本校學生)、陳易良(本校學生)、林顯杰(本校學生), "反射防止基板構造製造方法," 日本專利權特許第6148603號
 
期刊論文 Refereed Paper
1. Chiung-Wei Lin, Cheng-Hung Shen, and Bing-Ying Zhong, "Improving p-type mcro-oxidized ZnN film by efficient thermal treatment," Japanese Journal of Applied Physics , Vol. 59, SAAC02 (2020) SCI 
2. Chiung-Wei Lin and Bo-Cheng Liu, "Preparing p-type ZnO by micro-oxidation of PVD-ZnN," Jpn. J. Appl. Phys., Vol. 58, No. 2, SAAF02, Feb. 2019 SCI 
3. Chiung-Wei Lin, Wei-Chieh Chung, Zhao-De Zhang, and Ming-Chih Hsu, "P-channel transparent thin-film transistor using physical-vapor-deposited NiO layer," Japanese Journal of Applied Physics , Vol. 57, 01AE01 (2018) SCI 
4. Chiung-Wei Lin and Jia-Wei Wang, "Reducing the reflection of nanowhiskers on dielectric composite pyramids," Japanese Journal of Applied Physics, Vol. 56, 06GG08 (2017) SCI 
5. Chiung-Wei Lin and Bor-Chang Liu, "Effect of N2 flow during deposition on p-type ZnO film," Japanese Journal of Applied Physics, Vol. 56, No. 1, 01AB03, Jan. 2017 SCI 
6. Chiung-Wei Lin, Bo-Shen Zheng, and Jing-Wei Huang, "Formation of hybrid hafnium oxide by applying sacrificial silicon film," Japanese Journal of Applied Physics , Vol. 55, 01AA10, Jan. 2016 SCI 
7. Chiung-Wei Lin, Yue-Pu Song, and Shih-Chieh Chang, "Rapid thermal oxidation of zinc nitride film," Jpn. J. Appl. Phys., Vol. 54, No. 4, 04DH06, Apr. 2015 SCI 
8. Chiung-Wei Lin and Yao-Ting Tsai, "Improved Carrier Extraction of Solar Cell Using Transparent Current Spreading Layer," Thin Solid Films, Vol. 570, pp. 475-478, Nov. 2014 SCI 
9. C. W. Lin and Y. T. Chiang, "Tetragonal hafnium oxide film prepared by low-temperature oxidation," Jpn. J. Appl. Phys., Vol. 53, No. 11, 11RA07, Nov. 2014 SCI 
10. Chiung-Wei Lin, Po-Chi Ho, Shi-Jay Chang, and Wen-Wei Chen, "Nitridation of zinc oxide film by pulse mode rapid thermal annealing," Jpn. J. Appl. Phys., Vol. 53, 04EH06 (2014), Feb. 2014 SCI 
11. Chiung-Wei Lin, Shih-Hao Yang, and Cheng-Yen Li, "Ionic Nucleated Crystallized Silicon Thin-Film Transistor Fabricated at 130 oC," Thin Solid Films, Vol. 544, pp. 457-460, Sep. 2013 SCI 
12. Chiung-Wei Lin, Tao-Chang Tsai, and Yi-Liang Chen, "Improved microcrystalline silicon and gate insulator interface with a pad/buffer structure," Thi Solid Films, Vol. 529, pp. 398-401, Feb. 2013 SCI 
13. Chiung-Wei Lin and Cheng-Chieh Juan, "Less Reflective Sub-Wavelength Structure Formed on Textured Surface Using Nanosphere Mask," Japanese Journal of Applied Physics, Vol. 52, 01AD03, Jan. 2013 SCI 
14. Chiung Wei Lin and Yi Liang Chen, "Reducing the effects of mismatch between zinc oxide and silicon by silane plasma modification," J Mater Sci: Mater Electron, Vol. 23, No. 9, p. 1621, Sept. 2012 SCI 
15. Chiung-Wei Lin and Cheng-Yen Li, "Fast Deposition of Low Temperature Crystallized Silicon Films by Hybrid Nucleation," Jpn. J. Appl. Phys., Vol. 51 N. 8, 08HF02, Aug. 2012 SCI 
16. Chiung-Wei Lin, Ming-Hsien Yang, and Yeong-Shyang Lee, "Plasma Nitridation of Hydrogenated Silicon Nitride Film," Japanese Journal of Applied Physics , Vol. 51, 01AJ09, Jan. 2012 SCI 
17. C. W. Lin, S. C. Lee, and Y. S. Lee, "Crystallization of silicon films by new metal mediated mechanism," J. Material & Science: Materials in Electronics, Vol. 21, No. 3, p. 270, 2010 SCI 
18. Chiung Wei Lin, Yi Liang Chen, and Yeong Shyang Lee, "Micro-porous silicon structure with low optical reflection," Journal of Materials Science-Materials in Electronics, Vol. 20, No. 4, pp. 301-304, Apr. 2009 SCI EI 
19. Chiung-Wei LIN, Yi-Liang CHEN, Yeong-Shyang LEE, and Yung-Hui YEH, "Highly Uniform Polycrystalline Silicon Thin Films Fabricated by Metal Plate Energy-Assisted Agent Method," Japanese Journal of Applied Physics, Vol. 47, No. 6, pp. 4426–4429, 2008 SCI 
20. Chiung-Wei Lin, Chein-Fu Teng, and Yi-Liang Chen, "Effect of in-grain porous silicon structure on photovoltaic device," Journal of Physics and Chemistry of Solids, Vol. 69 pp.641–644, Feb. 2008 SCI EI 
21. Chiung-Wei Lin, Chih-Chao Chang, Yeong-Shyang Lee, and Yung-Hui Yeh, "High drivability mc-Si TFT device with a compound channel layer structure," Journal of Physics and Chemistry of Solids, Vol. 69 pp. 645–647, Feb. 2008 SCI EI 
22. Chiung-Wei Lin, * Pao-An Chang, and Yeong-Shyang Lee, "Germanium enhanced large-grain growth by pulse mode rapid thermal crystallization process," Journal of material science: materials in electronics, Vol. 18, No. 5, pp.475-480, May 2007 SCI EI 
23. Chiung-Wei Lin, Yen-Xin Chen, Yeong-Shyang Lee, and Young-Hui Yeh, "Effect of Self-Biased Nitrous Oxide Plasma on Plasma-Enhanced Chemical-Vapor-Deposited Silicon Oxide," Japanese Journal of Applied Physics, Vol. 46, No. 5A, pp. 2887–2891, May 2007 SCI EI 
24. Chiung-Wei LIN, Seng-Chi LEE, and Yeong-Shyang LEE, "High-Efficiency Crystallization of Amorphous Silicon Films on Glass Substrate by New Metal-Mediated Mechanism," Japanese Journal of Applied Physics, Vol. 44, No. 10, 2005, pp.7319-7326 SCI EI 
25. Chun-Yen Chang*, Yeong-Shyang Lee, Tiao-Yuan Huang, Po-Sheng Shih, and Chiung-Wei Lin, "The effects of microcrystalline silicon ®lm structure on low-high-low band-gap thin film transistor," Materials Chemistry and Physics, Vol. 62, pp. 153-157, 2000 SCI EI 
26.C.W. Lin and C.Y. Chang, "A Novel Thin-Film Transistor with Vertical Offset Structure," Jpn. J. Appl. Phys., Vol. 36 No. 4A, pp2032, 1997 SCI EI 
27.S.W. Hsieh, C.Y. Chang, Y.S. Lee, C.W. Lin and S.C. Hsu, "Properties of Plasma-Enhanced Chemical Vapor Deposited a-SiNx by Various Dilution Gases," J. Appl. Phys., Vol. 76, p.3645,1994 SCI EI 
 
短篇期刊論文 Short Paper
1.Y.L. Jiang, C.L. Chen, C.W. Lin and S.F. Huang, "Rapid and Efficient Recrystallization and Activation of Implanted Phosphorus Doping in Laser-Annealed Polysilicon by Rapid Energy Transfer Annealing," Jpn. J. Appl. Phys., Vol. 42 pp. L 1498, 2003. SCI EI 
2.Y.L. Jiang, C.L. Chen, C.W. Lin and S.F. Huang,, "Fast Grain Growth of Metal-Induced Lateral Crystallization of Amorphous Silicon Using Rapid Energy Transfer Annealing," Jpn. J. Appl. Phys., Vol. 42 pp. L 1416, 2003. SCI EI 
3.C.W. Lin, C.H. Tseng, T.K. Chang, C.W. Lin, W.T. Wang, and H.C. Cheng,, "A Novel Laser-Processed Self-Aligned Gate Overlapped LDD Poly-Si TFT," IEEE Electron Device Lett., Vol.23, No.3, pp.133, 2002 SCI EI 
4.C.Y. Chang and C.W. Lin,, "A High-Performance Thin-Film Transistor with a Vertical Offset Structure," IEEE Electron Device Lett.,, Vol. 17 No. 12 p.572, 1996 SCI EI 
5.S.W. Hsieh, C.Y. Chang, Y.S. Lee, C.W. Lin, B.S. Wu and H.K. Chen,, "Ambipolar Performance of Novel Amorphous Silicon-Germanium Alloy Thin-Film Transistor," Jpn. J. Appl. Phys., Vol. 32 p.L1043, 1993 SCI EI 
 
國際研討會論文 International Conference Paper
1. Chiung-Wei Lin, Cheng-Hung Shen, and Bing-Ying Zhong, "Improving p-type Micro-oxidized ZnN Film by Efficient Thermal Treatment," Int. Proc. ISPlasma, Nagoya, 18P1-35, Mar. 2019.
2. Chiung-Wei Lin and Po-Cheng Liu, "Preparing p-type ZnO by Micro-oxidation of PVD-ZnN," Int. Proc. ISPlasma, Nagoya, 05P13, Mar. 2018.
3. Chiung-Wei Lin, Wei-Chieh Chung, and Jing-Wei Huang, "NiO thin-film transistor with tetragonal HfO2 gate insulator," Int. Proc. DPS 2017, P-41, Nov. 2017
4. Chiung-Wei Lin and Jin-Wei Huang, "Low temperature tetragonal hafnium oxide films," Int. Proc. TACT, C-P-0156, Hualien, Oct. 2017
5. Chiung-Wei Lin and Wei-Ming Su, "Recovering Photocurrent by a Conducting Window Layer," Int. Proc. EDMS, PD-2, Hsinchu, Sep. 2017.
6. Chiung-Wei Lin, Wei-Chieh Chung, Zhao-De Zhang, and Ming-Chih Hsu, "P-channel transparent thin-film transistor using PVD-NiO layer," Int. Proc. ISPlasma, , Nagoya, 04P33, Mar. 2017
7. Chiung-Wei Lin and Jia-Wei Wang, "Fabrication of Less Reflective Nanowhisker on Textured Substrates," Int. Proc. MNC 2016, 10P-7-36, Kyoto, Nov. 2016
8. Chiung-Wei Lin and Shu-Jheng Lin, "Effect of Oxygen Flow on the Electrical Properties of Aluminum Zinc Oxide Transistor," Int. Proc. EDMS, PA-5, Taipei, Nov. 2016
9. Chiung-Wei Lin and Po-Chang Liu, "The Influence of Nitrogen Source on p-type ZnO Film," Int. Proc. ISPlasma, Nagoya, 07P17, Mar. 2016
10. Chiung-Wei Lin, Jia-Wei Wang, and Wei-Jei Chiou, "Formation of Less Reflective Nanowhisker on Textured Composite Dielectric," Int. Proc TACT, 2015, B-P-113, Tainan, Nov. 2015
11. Chiung-Wei Lin, Jia-Chi Chang, June Wei, and Yeong-Shyang Lee, "Plasma Crystallization of Silicon Films," Int. Proc. EDMS, 2015, P244, Tainan, Nov. 2015.
12. Chiung-Wei Lin, Bo-Sheng Zheng, and Jin-Wei Huang, "Formation of hybrid hafnium oxide using silicon source," Int. Proc ISPlasma, D3-p-03, Nagoya, Mar. 2015.
13. C. W. Lin and S. K. Hong, "Passivation of Nitrogen on Zinc Oxide Thin Film Transistor," Int. Proc. IEDMS, 2014, Hsinchu, #1162, Hualien, Nov. 2014.
14. C. W. Lin and Y. L. Chen, "Micro-Hydrogenation of Nanometric Amorphous Silicon Film," Int. Proc. VASSCAA, 2014, Hsinchu, PSS-009, Oct. 2014
15. Chiung-Wei Lin, Yue-Pu Song, and Shih-Chieh Chang, "Rapid thermal oxidation of zinc nitride film," Int. Proc SSDM, 2014, Tsukuba, C-6-3, Sep. 2014
16. C. W. Lin and Y. C. Chiang, "Tetragonal Hafnium Oxide Film Prepared by Low Temperature Oxidation," ISPlasma 2014, Nagoya, 05pP06, Mar. 2014
17. C. W. Lin and W. C. Chen, "Hydrogenation of Silicon Oxide Film by Diluted Plasma," IEDMS 2013, P1-69, Nov. 2013
18. C. W. Lin and Y. T. Tsai, "Improved Carrier Extraction of Solar Cell Using Transparent Current Spreading Layer," Int. Proc TACT, 2013, Taipei , C-P-517016, Oct. 2013
19. C. W. Lin, P. C. Ho, S. J. Chang, and W. W. Chen, "Nitridation of Zinc Oxide Film by Pulse Mode Rapid Thermal Annealing," Int. Proc SSDM, 2013, Fukouka, PS-8-10, Sep. 2013
20. C. W. Lin and W. W. Chen, "Two Stages Oxidation of Sputtering Deposited Hafnium," Int. Proc ISSP, 2013, Kyoto , TF P1-17, Jul. 2013
21. Chiung-Wei Lin and Yi-Liang Chen, "Improving a-Si/c-Si Heterojunction Using Micro-Hydrogenation," Int. Proc. ISPlasma, 2013, Nagoya, P2023A
22. Chiung-Wei Lin, Po-Chi Ho, and Bo-Sheng Zheng, "Effect of In-situ Doped Oxygen on the Electrical Properties of Sputtering Deposited Zinc Oxide Films," Int. Proc. EDMS 2012, CP-21, Nov. 2012
23. Chiung-Wei Lin, Shih-Hao Yang, and Cheng-Yen Li, "Ionic Nucleated Crystallized Silicon Thin-Film Transistor Fabricated at 130 oC," Int. Proc. ThinFilms2012, 2012, Singapore, ODF-2214
24. Chiung-Wei Lin and Cheng-Chieh Juan, "Less Reflective Sub-Wavelength Structure Formed on Textured Surface Using Nanosphere Mask," Int. Proc. ISPlasma, 2012, Nagoya, P1063C
25. Chiung-Wei Lin, Yi-Liang Chen, and Yeong-Shyang Lee, "Fabrication of ZnO/Si Heterojunction Structure," International Photonics Conference 2011 (IPC2011), PI-FR-23, Dec. 2011
26. Chiung-Wei Lin and Cheng-Yen Li, "Fast Deposition of Low Temperature Crystallized Silicon Films by Hybrid Nucleation Process," Int. Proc. DPS 2011, Kyoto, P2-04 Nov. 2011
27. Chiung-Wei Lin, Wei-Jyun Chen, and Po-Chi Ho, "Low Thermal Budget Polycrystalline Silicon Thin Film Transistors," Int. Proc. EDMS 2011, P-A-2, Nov. 2011
28. Chiung-Wei Lin and Yi-Liang Chen, "New transparent oxide semiconductor/silicon double heterojunction solar cell," Int. Proc. TACT 2011, A-058, Nov. 2011
29. Chiung-Wei Lin, Yao-Chan Tsai, and Yi-Liang Chen, "Improved Microcrystalline Silicon and Gate Insulator Interface with a Pad/Buffer Structure," Int. Proc. TACT 2011, C-115, Nov. 2011
30. Chiung-Wei Lin and Yi-Liang Chen, "Hydrogen and Argon Mixtures Plasma Treatment for Improving Intrinsic Layer for Heterojunction Solar Cells," Int. Proc ISSP, 2011, Kyoto, PP P-8, Jun. 2011
31. Chiung-Wei Lin, Shih-Hao Yang, Wen-Wei Chen, Shi-Jay Chang, Han-Sheng Chang, Po-Chie Ho, and Yeong-Shyang Lee, "Energetic Nucleation for Low Temperature Crystallized Silicon Film," Int. Proc ISSP, 2011, Kyoto, PI P-2, Jun. 2011
32. C. W. Lin, M. S. Yang, and Y. S. Lee, "Plasma Nitridation of Hydrogenated Silicon Nitride Film," Int. Proc ISPlasma, 2011, Nagoya, P4-027A
33. C. W. Lin and Y. L. Chen, "Reducing the Mismatch between Zinc Oxide and Silicon by Atomic Plasma Treatment," Int. Proc AVS-IPW, 2011, E008
34. C. W. Lin, P. C. Ho, and C. F. Lee, "The Correlation between Gate/Drain Overlap and Instability of uc-Si/a-Si Thin-Film Transistor," Int. Proc OPT, 2010, OPT7-P-035
35. C. W. Lin, Y. L. Chen, and W. M. Su, "The Role Transparent Conducting Oxide Film Plays on Reducing Parasitic Series Resistance of Silicon Solar Cells," Int. Proc IEDMS, 2010, P-A-2
36. Chiung-Wei Lin, Yi-Liang Chen, Shu-Jheng Lin, and Chi-Neng Mo, "The Fabrication of Thin-Film Transistors by Using Room Temperature Sputtering Deposited Aluminum-doped Zinc Oxide Film," 2009 International Display and Manufacturing Conference(IDMC), Wed-P1-09
37. Chiung-Wei Lin, Yao-Chang Tsai, Yi-Liang Chen, and Chi-Neng Mo, "The Effect of Helium Gas on Microcrystalline Silicon Thin Film Transistors," 2009 International Display and Manufacturing Conference (IDMC), Wed-P1-17
38. Chiung-Wei Lin, Yi-Liang Chen, and Wei-Ming Su, "Radio-Frequency Sputter Deposited Current-Recovering Layer for Solar Cells," Int. Proc IEDMS, 2008, EO-540, Nov. 28-29, 2008
39. C. W. Lin, Y.L. Chen, C.C. Chang, and Y.S. Lee, "Ion Controlled Nucleation for Silicon Crystallization," Int. Proc IEDMS, 2007, PD-023
40. 1. Y.S. Lee, C. W. Lin, C.C. Chang, C.Y. Hou, K.F. Huang, Y.H. Peng, C.H. Chen, and J.K. Chang, "Deposition of Porous-Free Microcrystalline Silicon Film for TFT Application in Large-Size AMLCDs," Int. Proc. IDW, 2007, Japan., AMDp-35
41.Yeong-Shyang Lee, Chih-Hsien Chen, Chiung-Wei Lin1, Ya-Hui Peng, Han-Tang Chou, Chan-Ching Chang, "Influence of Gate Dielectric Interface Treatment on the Performance of Amorphous Silicon Thin-Film Transistors for AMLCDs," Int. Proc. IDMC, 2007, ,Thu-P1-03
42.Yeong-Shyang LeeU, Feng-Yuan Gan, Chiung-Wei Lin*, Ching-Chieh Shih, Tsung-Yi Hsu, Jun-Kai Chang, "The Effect of Surface Plasma Treatment for n+ on Photocurrent Reduction in a-Si:H TFTs for AMLCDs," 2006 Information Display Workshop, AMD p-17
43. Chiung-Wei Lin, Chien-Feng Lee, Yeong-Shyang Lee, and Young-Hui Yeh, "High-Reliability Microcrystalline Silicon Thin Film Transistors," 2006 International Electron Devices and Materials Symposia, PD003
44. Chiung-Wei Lin and Yi-Liang Chen, "Metal Plate-Assisted Crystallization for Amorphous Silicon Films," 2006 International Electron Devices and Materials Symposia, PD042
45.Yeong-Shyang Lee, Jun-Kai Chang, Chiung-Wei Lin, Chien-Chien Tsai, Kuo-Lung Fang, Hun-Tu Lin, "Effects of Stress Mismatch on the Electrical Characteristics of Amorphous Silicon TFTs for Active-Matrix LCDs," IMID/IDMC 2006, Aug. 2006
46. Chiung-Wei Lin, Yi-Liang Chen, and Sheng-Chi Lee, "Highly Uniform Poly-Si Film Obtained by Energy-Assisted Agent," 2005 international symposium on point defect and nonstoichiometry, p2-74
47. Chiung-Wei Lin, Sheng-Chi Lee, Yi-Liang Chen, and De-Hua Deng, "A Metal Mediated Crystallization of Amorphous Silicon Film by Rapid Thermal Annealing," 2005 international symposium on point defect and nonstoichiometry, p2-57
48. Chiung-Wei Lin and Pao-An Chang, "Large Grain Crystallization of Germanium Doped Silicon Film by Infrared Rapid Thermal Annealing," 2005 international symposium on point defect and nonstoichiometry, p2-40
49. Chiung-Wei Lin, Chein-Fu Teng, and Yi-Liang Chen, "Effect of In-Grain Porous Silicon Structure on Photovoltaic Device," 2005 international symposium on point defect and nonstoichiometry, p2-4
50. Chiung-Wei Lin, C.C.Chang, Chih-Chao Chang, Y.S.Lee, and Y.H.Yeh, "High drivability μc-Si TFT device with a compound channel layer structure," 2005 international symposium on point defect and nonstoichiometry, p2-3
51.C. W. Lin, C.K. Kang, S. C. Lee, Y.S. Lee, and C.Y. Chang,, "Polycrystalline Silicon Film formed on Plastic Substrate by Rapid Thermal Crystallization Technology," Int. Proc. IDMC, 2005, Wed-P3-09
52. C. W. Lin, C.K. Kang, C.F. Deng, and S. C. Lee, "Excimer Laser Crystallized Polycrystalline Silicon on Plastic Substrate," Int. Proc. ICA, 2004, O-065
53.C. W. Lin, S. C. Lee, and C.K. Kang,, "The Study on the Crystallization of Semiconductor Film by Rapid Thermal Annealing Process," Int. Proc. ICA, 2004,, O-064
54.Y. H. Yeh, N.H. Kung, C.L. Chen, Y.F. Wu, C.C. Chen, T.H. Chen, C.R. Chen, C.W. Lin, J.X. Lin, C., "3.8-inch Multi-Color Active-Matrix OLED/PLED with Highly Smooth Low Temperature p-ITO Surface Morphology," Int. Proc. Eurodisplay 2002., p.29,
55.D.Z. Peng, H.W. Zan, P.S. Shih, T.C. Chang, C.W. Lin and C.Y. Chang,, "Comparison of Poly-Si Films Deposited by UHVCVD and LPCVD and Its Application for Thin Film Transistors," Int. Proc. 7th EUROPEAN VACUUN CONFERENCE,, EVC-7, 2001
56.D.Z. Peng, P.S. Shih, H.W. Zan, C.Y. Chang, T.C. Chang, and C.W. Lin, "A Novel Self-Aligned SiGe Elevated S/D Polycrystalline-Silicon Thin-Film Transistor," Int. Proc. SID, 2002, p-56
57.C.Y. Chang, C.W. Lin, and H.Y. Lin,, "High Performance Low Temperature Poly-a-Si Thin Film Transistor for Active Matrix Liquid Crystal Display," Int. Proc. EDMS, 1996, pp223
58.C.W. Lin and C.Y. Chang,, "A Novel Vertical Offset Thin-Film Transistor with High Performance," Int. Proc AM-LCD’96,, pp253
59.C.Y. Chang, S.W. Hsieh, C.W. Lin and Y.S. Lee,, "The Influence of Nitrogen, Helium, Hydrogen, or Argon Dilution on Plasma-Enhanced Chemical Vapor Deposited a-SiNx," Int. Proc. EDMS, 1994, pp.158
 
區域研討會論文 Domestic Conference Paper
1. Chiung-Wei Lin, Sheng-Chi Lee, and Yi-Liang Chen, "The Influence of Metal Pattern on the Rapid Thermal Crystallization of Amorphous Silicon," 2006 Conference on Microelectronics Technology and Applications, pp. 18, 2006
2.C. W. Lin, P. A. Chang, S. C. Lee, C. F. Lee, and Y.L. Chen,, "A Study on Crystallization of Amorphous Semiconductor by Infrared Ray Technology," 中華民國物理學會年會, PD-15
3. C. W. Lin and S. C. Lee, "Application to Metal Induced Lateral Crystallization (MILC) of Silicon Film on Glass Substrate by Rapid Thermal Process (RTP) System," 中華民國物理學會年會, PD-20