- C. S. Yang, K. F. Chien, J. S. Wang, J. Y. Lai, C.W. Luo, W. C. Chou, Y. T. Shih and S. R. Jian, "Carrier Dynamics in Self-assembled CdTe Stranski-Krastanow Quantum Dots Grown on ZnSe by Molecular Beam Epitaxy," Journal of the Korean Physics Society, vol.53, No. 5, pp2905~2908 , Nov. 2008 SCI
 (97/11)
- J.S. Wang, C.S. Yang, M.J. Liou, C.X. Wu, K.C. Chiu and W.C. Chou, "Influence of Zn/O flux ratio and Mn-doped ZnO buffer on the plasma-assisted molecular beam epitaxy of ZnO on c-plane sapphire," Journal of Crystal Growth, Vol. 310 (2008) 4503 SCI (97/10)
- D.J. Jang, M.E. Lee, Y.H. Chung, C.S. Yang and W.C. Chou, "Carrier Relaxation of ZnCdSe/ZnSe Quantum Wells," Japanese Journal of Applied Physics, Vol. 47, No. 9, pp. 7056-7059, 2008 SCI (97/09)
- Ping-Feng Yang, Sheng-Rui Jian, Yi-Shao Lai, Chu-Shou Yang and Rong-Sheng Chen, "Morphological, structural, and mechanical characterizations of InGaN thin films deposited by MOCVD," Journal of Alloys and Compounds, Vol. 463, pp.533–538 (2008) SCI (97/07)
- H. J. Lin, D. Y. Lin, J. S. Wu, W. C. Chou, C.S. Yang, J. S. Wang and W. H. Lo, "Optical Characterization of ZnMnO Thin Films on c-Al2O3," Journal of the Korean Physical Society, Vol. 53, pp. 98101,July 2008 SCI (97/07)
- Sheng-Rui Jian, Yuan-Tsung Chen, Chih-Feng Wang, Hua-Chiang Wen, Wei-Ming Chiu and Chu-Shou Yang, "The Influences of H2 Plasma Pretreatment on the Growth of Vertically Aligned Carbon Nanotubes by Microwave Plasma Chemical Vapor Deposition," Nanoscale Res. Lett., Vol. 3, pp. 230-235, June 2008 SCI (97/06)
- Kuan-Cheng Chiu, Liu-Ting Juey, Chih-Feng Su, Shiow-Jing Tang, Ming-Nan Jong, Sheng-Shin Wang, Jyh-Shyang Wang and Chu-Shou Yang, "Effects of source and substrate temperatures on the properties of ITO/CuPc/C60 heterostructure prepared by physical vapor deposition," Journal of Crystal Growth, Vol. 310 (2008) 1734–1738 SCI (97/04)
- Sheng-Rui Jian, Jason Shian-Ching Jang, Yi-Shao Lai, Ping-Feng Yang, Chu-Shou Yang, Hua-Chiang Wen and Chien-Huang Tsai, "Mechanical properties of InGaN thin films deposited by metal-organic chemical vapor deposition," Materials Chemistry and Physics, Vol. 109 (2008) 360–364 SCI (97/04)
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